At-wavelength optical metrology development at the ALS

Sheng Yuan; Kenneth A. Goldberg; Valeriy V. Yashchuk; Richard Celestre; Iacopo Mochi; James Macdougall; Gregory Y. Morrison; Brian V. Smith; Edward E. Domning; Wayne R. McKinney; Tony Warwick

doi:10.1117/12.859946

27 August 2010 At-wavelength optical metrology development at the ALS

Sheng Yuan, Kenneth A. Goldberg, Valeriy V. Yashchuk, Richard Celestre, Iacopo Mochi, James Macdougall, Gregory Y. Morrison, Brian V. Smith, Edward E. Domning, Wayne R. McKinney, Tony Warwick

Author Affiliations +

Proceedings Volume 7801, Advances in Metrology for X-Ray and EUV Optics III; 78010D (2010) https://doi.org/10.1117/12.859946
Event: SPIE Optical Engineering + Applications, 2010, San Diego, California, United States

Abstract

Nano-focusing and brightness preservation for ever brighter synchrotron radiation and free electron laser beamlines require surface slope tolerances of x-ray optics on the order of 100 nrad. While the accuracy of fabrication and ex situ metrology of x-ray mirrors has improved over time, beamline in situ performance of the optics is often limited by application specific factors such as x-ray beam heat loading, temperature drift, alignment, vibration, etc. In the present work, we discuss the recent results from the Advanced Light Source developing high accuracy, in situ, at-wavelength wavefront measurement techniques to surpass 100-nrad accuracy surface slope measurements with reflecting x-ray optics. The techniques will ultimately allow closed-loop feedback systems to be implemented for x-ray nano-focusing. In addition, we present a dedicated metrology beamline endstation, applicable to a wide range of in situ metrology and test experiments. The design and performance of a bendable Kirkpatrick-Baez (KB) mirror with active temperature stabilization will also be presented. The mirror is currently used to study, refine, and optimize in situ mirror alignment, bending and metrology methods essential for nano-focusing application.

Citation Download Citation

Sheng Yuan, Kenneth A. Goldberg, Valeriy V. Yashchuk, Richard Celestre, Iacopo Mochi, James Macdougall, Gregory Y. Morrison, Brian V. Smith, Edward E. Domning, Wayne R. McKinney, and Tony Warwick "At-wavelength optical metrology development at the ALS", Proc. SPIE 7801, Advances in Metrology for X-Ray and EUV Optics III, 78010D (27 August 2010); https://doi.org/10.1117/12.859946

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available