25 August 2010 Study of 18.2-nm Schwarzschild microscope for plasma diagnostics
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A Schwarzschild microscope at 18.2 nm for ultra-fast laser plasma diagnostics has been developed. Based on the third-order aberration the microscope is designed for numerical aperture of 0.1 and magnification of 10. Spatial resolution of the objective can achieve 1250 lp/mm within the field of ±1 mm. Mo/Si multilayer films with peak throughout at 18.2 nm is designed and deposited by magnetron sputtering, and the measured reflectivity of optical elements is 45%. The 600 lp/inch copper grid backlit by laser produced plasma is imaging via Schwarzschild microscope on CCD. The spatial resolution is measured as 3 μm approximately in the field of 1.2 mm.
© (2010) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Xin Wang, Xin Wang, Baozhong Mu, Baozhong Mu, Yi Huang, Yi Huang, Zirong Zhai, Zirong Zhai, Shengzhen Yi, Shengzhen Yi, Li Jiang, Li Jiang, Jingtao Zhu, Jingtao Zhu, Zhanshan Wang, Zhanshan Wang, Hongjie Liu, Hongjie Liu, Leifeng Cao, Leifeng Cao, Yuqiu Gu, Yuqiu Gu, "Study of 18.2-nm Schwarzschild microscope for plasma diagnostics", Proc. SPIE 7801, Advances in Metrology for X-Ray and EUV Optics III, 78010G (25 August 2010); doi: 10.1117/12.860281; https://doi.org/10.1117/12.860281


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