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1 September 2010 A novel adaptive bimorph focusing mirror and wavefront corrector with sub-nanometre dynamical figure control
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Abstract
We present the design, fabrication and characterization of a novel adaptive X-ray optic by bringing together bimorph adaptive technology and the novel Elastic Emission Machining "super-polishing" technique. This super-polished adaptive mirror provides variable focal distance and local figure control in the sub-nm range. The optic has the potential to generate distortion-free beams, and enable wavefront control.
© (2010) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Kawal J. S. Sawhney, Simon G. Alcock, and Riccardo Signorato "A novel adaptive bimorph focusing mirror and wavefront corrector with sub-nanometre dynamical figure control", Proc. SPIE 7803, Adaptive X-Ray Optics, 780303 (1 September 2010); https://doi.org/10.1117/12.861593
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