25 September 2010 Mask Industry Assessment: 2010
Author Affiliations +
Proceedings Volume 7823, Photomask Technology 2010; 782303 (2010); doi: 10.1117/12.868465
Event: SPIE Photomask Technology, 2010, Monterey, California, United States
Abstract
A survey created supported by SEMATECH and administered by David Powell Consulting was sent to microelectronics industry leaders to gather information about the mask industry as an objective assessment of its overall condition. The survey was designed with the input of semiconductor company mask technologists and merchant mask suppliers. This year's assessment is the ninth in the current series of annual reports. With ongoing industry support, the report can be used as a baseline to gain perspective on the technical and business status of the mask and microelectronics industries. It will continue to serve as a valuable reference to identify the strengths and opportunities of the mask industry. The results will be used to guide future investments pertaining to critical path issues. This year's survey was basically the same as the 2005 through 2009 surveys. Questions are grouped into categories: General Business Profile Information, Data Processing, Yields and Yield Loss Mechanisms, Delivery Times, Returns, and Services. Within each category are multiple questions that result in a detailed profile of both the business and technical status of the critical mask industry. This profile combined with the responses to past surveys represents a comprehensive view of changes in the industry.
© (2010) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Greg Hughes, David Y. Chan, "Mask Industry Assessment: 2010", Proc. SPIE 7823, Photomask Technology 2010, 782303 (25 September 2010); doi: 10.1117/12.868465; https://doi.org/10.1117/12.868465
PROCEEDINGS
13 PAGES


SHARE
KEYWORDS
Photomasks

Data processing

Microelectronics

Current controlled current source

Photomask technology

Semiconductors

RELATED CONTENT

Turret-type electron gun for EBM-8000
Proceedings of SPIE (September 09 2013)
Mask industry assessment: 2006
Proceedings of SPIE (October 20 2006)
Mask industry assessment trend analysis
Proceedings of SPIE (June 21 2006)
Mask Industry Assessment: 2011
Proceedings of SPIE (October 13 2011)
Mask industry assessment: 2005
Proceedings of SPIE (November 04 2005)
Mask industry assessment trend analysis: 2010
Proceedings of SPIE (May 14 2010)

Back to Top