Photomask Japan each year hosts a meeting inviting the conference attendees to actively participate in a discussion on a
selected topic. The topic selected for this year is on new mask inspection and metrology techniques that are just
emerging in the market, namely, aerial/wafer image based inspection and metrology, and optical high sampling
frequency CD uniformity measurement. The panel discussion hopes to identify potential values of each technique and
at the same time discover any challenge if the industry were to adopt such technique.