24 September 2010 Photomask Japan 2010 panel discussion overview
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Photomask Japan each year hosts a meeting inviting the conference attendees to actively participate in a discussion on a selected topic. The topic selected for this year is on new mask inspection and metrology techniques that are just emerging in the market, namely, aerial/wafer image based inspection and metrology, and optical high sampling frequency CD uniformity measurement. The panel discussion hopes to identify potential values of each technique and at the same time discover any challenge if the industry were to adopt such technique.
© (2010) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Yoshinori Nagaoka, Yoshinori Nagaoka, Hiroshi Mohri, Hiroshi Mohri, Shinji Akima, Shinji Akima, } "Photomask Japan 2010 panel discussion overview", Proc. SPIE 7823, Photomask Technology 2010, 782306 (24 September 2010); doi: 10.1117/12.868534; https://doi.org/10.1117/12.868534

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