6-inch circle template fabrication for patterned media

Kimio Itoh; Morihisa Hoga; Nobuhito Toyama

doi:10.1117/12.867541

24 September 2010 6-inch circle template fabrication for patterned media

Kimio Itoh, Morihisa Hoga, Nobuhito Toyama

Proceedings Volume 7823, Photomask Technology 2010; 78230P (2010) https://doi.org/10.1117/12.867541
Event: SPIE Photomask Technology, 2010, Monterey, California, United States

Abstract

Nanoimprint lithography (NIL) is one promising candidate for fabricating a patterned media to be used in the next generation of hard disk drives (HDD). It is expected that the pitch, characterizing the feature size of the media will become as small as about 40-50 nm for discrete-track recording (DTR) in 2011 or 2012. There are two major issues, one is fine groove formation and the other is long e-beam writing time. Writing time is estimated more than one week if we use ZEP520A-resist. To solve these problems, master template fabrication processes using combination of silicon substrate and new chemically amplified resist (CAR) were demonstrated by using a rotary stage e-beam writer and 50 nm pitch DTR patterns. Estimated writing speed is three times higher. Also it was demonstrated that silicon master template can be applicable for J-FIL quartz replica process.

Citation Download Citation

Kimio Itoh, Morihisa Hoga, and Nobuhito Toyama "6-inch circle template fabrication for patterned media", Proc. SPIE 7823, Photomask Technology 2010, 78230P (24 September 2010); https://doi.org/10.1117/12.867541

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