25 September 2010 Optimization of MDP, mask writing, and mask inspection for mask manufacturing cost reduction
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Proceedings Volume 7823, Photomask Technology 2010; 78230S (2010); doi: 10.1117/12.864196
Event: SPIE Photomask Technology, 2010, Monterey, California, United States
As the feature sizes of LSI become smaller, the increase in mask manufacturing time (TAT) and cost is becoming critical and posing challenges to the mask industry and device manufacturers. In May 2006, ASET Mask D2I launched a 4-year program for the reduction in mask manufacturing TAT and cost, and the program was completed in March 2010. The focus of the program was on the design and implementation of a synergetic strategy involving concurrent optimization of MDP, mask writing, and mask inspection. The strategy was based upon four key elements: a) common data format, b) pattern prioritization based on design intent, c) an improved approach in the use of repeating patterns, and d) parallel processing. In the program, various software and hardware tools were developed to realize the concurrent optimization. After evaluating the effectiveness of each item, we estimated the reduction in mask manufacturing TAT and cost by the application of results obtained from the Mask D2I programs. We found that mask manufacturing TAT and cost can be reduced to 50% (or less) and to about 60% respectively.
© (2010) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Masaki Yamabe, Tadao Inoue, Masahiro Shoji, Akio Yamada, Hiromichi Hoshi, Kenichi Takahara, "Optimization of MDP, mask writing, and mask inspection for mask manufacturing cost reduction", Proc. SPIE 7823, Photomask Technology 2010, 78230S (25 September 2010); doi: 10.1117/12.864196; https://doi.org/10.1117/12.864196





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