24 September 2010 Generalization of shot definition for variable shaped e-beam machines for write time reduction
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Abstract
We propose a new aperture stage for shaped e-beam exposure tools. This aperture stage is able to print an "L" shape in a single exposure shot. The aperture may be used in mask- and wafer-patterning e-beam tools. The physical and mechanical nature of the aperture appears to be fundamentally similar to existing apertures that form rectangular shapes, yet it reduces the required shot count for exposure by as much as half.
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Emile Sahouria, Amanda Bowhill, "Generalization of shot definition for variable shaped e-beam machines for write time reduction", Proc. SPIE 7823, Photomask Technology 2010, 78230T (24 September 2010); doi: 10.1117/12.867994; https://doi.org/10.1117/12.867994
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