29 September 2010 SMO mask requirements for low k1 lithography
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Abstract
This paper tries to clarify the requirements for Source-Mask co-Optimization (SMO) type complex masks for low k1 technology nodes using a dedicated test mask. The current status of mask CD requirements and inspection capability for Free Form (FF) SRAFs which give wider process window are discussed by comparing with Rectangular Shape (RS) SRAFs. From CD deviation analysis with CD bias change at both main and SRAF patterns, the importance of CD control at entire SRAF is emphasized although the partial lack of SRAF seems to give less impact on the main pattern lithography performance. It is also suggested that SRAF printability of FF-SRAF needs to be carefully controlled with mask bias error consideration. To identify the defects which give impact on litho performance, simulation-based defect printability prediction (M-LMC) using inspection images is evaluated and found to be an important enabler for complex mask inspection. The simulation-image based defect analysis helps to reduce the nuisance defects, and greatly saves analysis time of measurement on Aerial Image Measurement System (AIMSTM). To introduce the complex free form mask into production, mask-writing shot-count reduction is also evaluated. It is shown that fragmentation using Model- Based (MB) Mask Data Preparation (MDP) effectively reduces the mask writing shot counts with using overlapping of the patterns.
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Seiji Nagahara, Seiji Nagahara, Kazuyoshi Kawahara, Kazuyoshi Kawahara, Hiroshi Yamazaki, Hiroshi Yamazaki, Akihiko Ando, Akihiko Ando, Masayuki Naganuma, Masayuki Naganuma, Kazuyuki Yoshimochi, Kazuyuki Yoshimochi, Takayuki Uchiyama, Takayuki Uchiyama, Ken Nakashima, Ken Nakashima, Hidemichi Imai, Hidemichi Imai, Katsuya Hayano, Katsuya Hayano, Hidekazu Migita, Hidekazu Migita, Eiji Tsujimoto, Eiji Tsujimoto, "SMO mask requirements for low k1 lithography", Proc. SPIE 7823, Photomask Technology 2010, 782310 (29 September 2010); doi: 10.1117/12.864317; https://doi.org/10.1117/12.864317
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