Cell projection use and multi column approach for throughput enhancement of EBDW system

Akio Yamada; Yoshihisa Ooae

doi:10.1117/12.868975

24 September 2010 Cell projection use and multi column approach for throughput enhancement of EBDW system

Akio Yamada, Yoshihisa Ooae

Proceedings Volume 7823, Photomask Technology 2010; 78231H (2010) https://doi.org/10.1117/12.868975
Event: SPIE Photomask Technology, 2010, Monterey, California, United States

Abstract

The authors proposed a throughput enhancement of an e-beam direct writer by the combination of three key technologies; multi column cell, character projection, and high current density column technologies. They have finished proof-of-concept evaluations of multi column cell and character projection in the MASK-D2I project of ASET, including mix-and-match overlay results of better than 5nm. They found adequate conditions for the application of these three technologies to achieve the throughput above 5 wafers per hour in an e-beam direct writer.

Citation Download Citation

Akio Yamada and Yoshihisa Ooae "Cell projection use and multi column approach for throughput enhancement of EBDW system", Proc. SPIE 7823, Photomask Technology 2010, 78231H (24 September 2010); https://doi.org/10.1117/12.868975

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