24 September 2010 A full chip MB-SRAF placement using the SRAF guidance map
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A fast model-based technique for SRAF placements is proposed in this paper. This technique first constructed an image pixel map with values presenting the sensitivity of improving process window on the desired pattern. The sensitivity value was derived based on contrast improvement with a defocus model. Then high value pixels were selected and constructed to form SRAF with MRC regulations. This technique does not require iterations to produce SRAF and achieves very fast runtime with simple mask shapes, thus can be used in full-chip productions. We called this technique the SRAF guidance map, SGM
© (2010) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Min-Chun Tsai, Min-Chun Tsai, Shigeki Nojima, Shigeki Nojima, Masahiro Miyairi, Masahiro Miyairi, Tatsuo Nishibe, Tatsuo Nishibe, Been-Der Chen, Been-Der Chen, Hanying Feng, Hanying Feng, William Wong, William Wong, Zhangnan Zhu, Zhangnan Zhu, Yen-Wen Lu, Yen-Wen Lu, } "A full chip MB-SRAF placement using the SRAF guidance map", Proc. SPIE 7823, Photomask Technology 2010, 78233Q (24 September 2010); doi: 10.1117/12.866139; https://doi.org/10.1117/12.866139

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