Proceedings Volume 7842 is from: Logo
26-29 September 2010
Boulder, Colorado, United States
Front Matter
Proc. SPIE 7842, Front Matter: Volume 7842, 784201 (21 December 2010); doi: 10.1117/12.885768
Thin Films I
Proc. SPIE 7842, Advances in ion beam sputtered Sc2O3 for optical interference coatings, 784202 (6 December 2010); doi: 10.1117/12.855604
Proc. SPIE 7842, Complex study of zirconia-silica and niobia-silica composite coatings produced by ion beam sputtering, 784203 (25 November 2010); doi: 10.1117/12.867259
Thin Films II
Proc. SPIE 7842, Study of laser induced damage of high reflector at 1064 nm, 784205 (1 December 2010); doi: 10.1117/12.867241
Proc. SPIE 7842, BDS thin film UV antireflection laser damage competition, 784206 (29 November 2010); doi: 10.1117/12.867742
Thin Films III
Proc. SPIE 7842, Investigations on SiO2/HfO2 mixtures for nanosecond and femtosecond pulses, 784207 (1 December 2010); doi: 10.1117/12.867238
Proc. SPIE 7842, Laser damage by ns and sub-ps pulses on hafnia/silica anti-reflection coatings on fused silica double-sided polished using zirconia or ceria and washed with or without an alumina wash step, 784208 (29 November 2010); doi: 10.1117/12.868350
Proc. SPIE 7842, Mixed metal dielectric pulse compression gratings, 784209 (29 November 2010); doi: 10.1117/12.866869
Proc. SPIE 7842, Submicrometer-resolution mapping of ultraweak 355-nm absorption in HfO2 monolayers using photothermal heterodyne imaging, 78420A (1 December 2010); doi: 10.1117/12.868236
Poster Session: Thin Films
Proc. SPIE 7842, Laser induced damage threshold of 266 AR coatings with different coating designs, 78420B (1 December 2010); doi: 10.1117/12.867105
Proc. SPIE 7842, Laser damage resistance of dichroic mirrors at 532nm and 1064nm, 78420C (29 November 2010); doi: 10.1117/12.867216
Proc. SPIE 7842, Effects of electric field distribution and pulse duration on the ultra-short pulse laser damage resistance of laser coatings, 78420D (29 November 2010); doi: 10.1117/12.867225
Proc. SPIE 7842, LIDT of HfO2/SiO2 HR films by different test modes at 1064nm and 532nm, 78420E (2 December 2010); doi: 10.1117/12.867226
Proc. SPIE 7842, Database on laser-induced damage thresholds for AR and HR coatings in Japan, 78420F (2 December 2010); doi: 10.1117/12.867235
Proc. SPIE 7842, Exposure of high-reflecting fluoride coatings under high fluence conditions at 193nm, 78420I (7 December 2010); doi: 10.1117/12.867257
Proc. SPIE 7842, S on 1 testing of AR and HR designs at 1064nm, 78420J (29 November 2010); doi: 10.1117/12.867284
Proc. SPIE 7842, Investigation of laser damage in single layer coatings with pulse durations from 45fs to 24ps, 78420K (29 November 2010); doi: 10.1117/12.867506
Fundamental Mechanisms I
Proc. SPIE 7842, Imaging the early material response associated with exit surface damage in fused silica, 78420M (1 December 2010); doi: 10.1117/12.867724
Proc. SPIE 7842, Temperature activated absorption during laser-induced damage: the evolution of laser-supported solid-state absorption fronts, 78420N (2 December 2010); doi: 10.1117/12.867723
Proc. SPIE 7842, Densification and residual stress induced by CO2 laser-based mitigation of SiO2 surfaces, 78420O (1 December 2010); doi: 10.1117/12.867727
Proc. SPIE 7842, An assessment of molecular dynamic force fields for silica for use in simulating laser damage mitigation, 78420P (2 December 2010); doi: 10.1117/12.867741
Proc. SPIE 7842, Three-dimensional multiphysical model for the study of photo-induced thermal effects in laser damage phenomena, 78420Q (29 November 2010); doi: 10.1117/12.867286
Fundamental Mechanisms II
Proc. SPIE 7842, Characterisation of contaminant plumes arising from laser-solid target interactions, 78420R (7 December 2010); doi: 10.1117/12.867393
Proc. SPIE 7842, Modeling of laser-induced damage in KDP crystals by nanosecond pulses: a preliminary hydrodynamic study, 78420S (29 November 2010); doi: 10.1117/12.867254
Proc. SPIE 7842, Identification of the laser-induced damage mechanisms in KDP by coupling 355nm and 1064nm nanosecond pulses, 78420T (29 November 2010); doi: 10.1117/12.867234
Proc. SPIE 7842, Frequency dependence in the initiation of ultrafast laser-induced damage, 78420U (29 November 2010); doi: 10.1117/12.867347
Proc. SPIE 7842, The vacuum effect of femtosecond LIDT measurements on dielectric films, 78420V (2 December 2010); doi: 10.1117/12.867996
Poster Session: Fundamental Mechanisms
Proc. SPIE 7842, Femtosecond laser damage and ablation of dielectrics: determinism, selectivity, and nanometric resolution, 78420W (29 November 2010); doi: 10.1117/12.866738
Proc. SPIE 7842, Temperature dependence of nonlinear optical phenomena in silica glasses, 78420X (29 November 2010); doi: 10.1117/12.867240
Proc. SPIE 7842, 3D morphology of laser-induced bulk damage at 355 and 1064nm in KDP crystal with different orientations, 78420Y (29 November 2010); doi: 10.1117/12.867244
Proc. SPIE 7842, Calculation and measurement of fs-LIDT of TixSi(1-x)O2-mixtures, 78420Z (2 December 2010); doi: 10.1117/12.867736
Proc. SPIE 7842, KDP crystal orientation influence on the nanosecond laser-induced damage at 1064nm, 784210 (29 November 2010); doi: 10.1117/12.867982
Proc. SPIE 7842, Femtosecond pulse S on 1 LIDT in dielectric materials: comparison of experiment and theory, 784211 (29 November 2010); doi: 10.1117/12.868035
Proc. SPIE 7842, Extreme nonlinear optics and laser damage, 784213 (2 December 2010); doi: 10.1117/12.871195
Mini-symposium: Fundamentals of Laser Ablation
Proc. SPIE 7842, Insight from molecular dynamics simulation into ultrashort-pulse laser ablation, 784214 (29 November 2010); doi: 10.1117/12.867106
Proc. SPIE 7842, Modeling of laser-induced ionization of solid dielectrics for ablation simulations: role of effective mass, 784216 (2 December 2010); doi: 10.1117/12.869760
Materials and Measurements I
Proc. SPIE 7842, Multiscale analysis: a way to investigate laser damage precursors in materials for high power applications at nanosecond pulse duration, 784217 (6 December 2010); doi: 10.1117/12.855605
Proc. SPIE 7842, Determination of laser damage initiation probability and growth on fused silica scratches, 784218 (2 December 2010); doi: 10.1117/12.867734
Materials and Measurements II
Proc. SPIE 7842, Comparing the use of 4.6 μm lasers versus 10.6 μm lasers for mitigating damage site growth on fused silica surfaces, 784219 (2 December 2010); doi: 10.1117/12.867747
Proc. SPIE 7842, An empirical investigation of the laser survivability curve, 78421B (2 December 2010); doi: 10.1117/12.867349
Proc. SPIE 7842, A programmable beam shaping system for tailoring the profile of high fluence laser beams, 78421C (2 December 2010); doi: 10.1117/12.867728
Proc. SPIE 7842, Effective and efficient optics inspection approach using machine learning algorithms, 78421D (2 December 2010); doi: 10.1117/12.867648
Materials and Measurements III
Proc. SPIE 7842, Laser-induced contamination mitigation on the ALADIN laser for ADM-Aeolus, 78421E (6 December 2010); doi: 10.1117/12.867268
Proc. SPIE 7842, High-intensity fibre laser design for micro-machining applications, 78421G (29 November 2010); doi: 10.1117/12.863830
Proc. SPIE 7842, Improvement of laser damage resistance and diffraction efficiency of multilayer dielectric diffraction gratings by HF etchback linewidth tailoring, 78421H (4 December 2010); doi: 10.1117/12.867921
Poster Session: Materials and Measurements
Proc. SPIE 7842, Explaining laser-induced damage behavior of fused silica in a large-aperture laser using a small-aperture damage test, 78421J (29 November 2010); doi: 10.1117/12.866331
Proc. SPIE 7842, Characterization of preform raw materials for high power fiber lasers using LID absorption measurement technique, 78421M (29 November 2010); doi: 10.1117/12.867230
Proc. SPIE 7842, Dual wavelength laser damage testing for high energy lasers, 78421O (2 December 2010); doi: 10.1117/12.867743
Proc. SPIE 7842, Population kinetics of the fluorescing MNa center state in CaF2 upon fs laser excitation at 392 nm and 262 nm, 78421R (29 November 2010); doi: 10.1117/12.867256
Proc. SPIE 7842, Linear and non-linear absorption of Ti(x)Si(1-x)O2-Mixtures, 78421S (2 December 2010); doi: 10.1117/12.867767
Proc. SPIE 7842, Effects of thermal annealing on KDP and DKDP on laser damage resistance at 3w, 78421T (2 December 2010); doi: 10.1117/12.868269
Proc. SPIE 7842, Study of relation between crystal structure and laser damage of calcium fluoride, 78421U (4 December 2010); doi: 10.1117/12.869770
Surfaces, Mirrors, and Contamination I
Proc. SPIE 7842, Developing magnetorheological finishing (MRF) technology for the manufacture of large-aperture optics in megajoule class laser systems, 78421W (4 December 2010); doi: 10.1117/12.855603