Laser damage resistance of dichroic mirrors at 532nm and 1064nm

Xinbin Cheng; Zhengxiang Shen; Hongfei Jiao; Jinlong Zhang; Bin Ma; Tao Ding; Zhanshan Wang

doi:10.1117/12.867216

29 November 2010 Laser damage resistance of dichroic mirrors at 532nm and 1064nm

Xinbin Cheng, Zhengxiang Shen, Hongfei Jiao, Jinlong Zhang, Bin Ma, Tao Ding, Zhanshan Wang

Proceedings Volume 7842, Laser-Induced Damage in Optical Materials: 2010; 78420C (2010) https://doi.org/10.1117/12.867216
Event: Laser Damage Symposium XLII: Annual Symposium on Optical Materials for High Power Lasers, 2010, Boulder, Colorado, United States

Abstract

HfO₂/SiO₂ dichroic mirrors were prepared using reactive electron beam evaporation process. The mirrors have high reflectance at 532 nm (S polarization) and high transmittance at 1064 nm (P polarization) for angle of incidence of 45°. Here we report the laser damage behaviors of the dichroic mirrors that were irradiated by 532 nm and 1064 nm nanosecond laser pulse separately. The influence of substrate polishing quality on the laser damage resistance of HfO₂/SiO₂ dichroic mirrors was also discussed. At 1064 nm, the nano-sized absorbers between coatings and substrate interface or subsurface are the precusors for creating damage. And the poor substrate polishing quality significantly decreases the laser induced damage threshold (LIDT). At 532 nm, two distinct damage behaviors initiating from visible nodules and nano-sized absorbers were observed. Nodules are ejected at low fluence but the ejected pits are very stable until quite high fluence around 20J/cm² (1 ns). The nano-sized absorbers trigger damage at medium fluence around 14J/cm² (1 ns), and this kind of damage grows very fast during subsequent irradiations. The substrate polishing quality has minor influence on the LIDT at 532 nm.

Citation Download Citation

Xinbin Cheng, Zhengxiang Shen, Hongfei Jiao, Jinlong Zhang, Bin Ma, Tao Ding, and Zhanshan Wang "Laser damage resistance of dichroic mirrors at 532nm and 1064nm", Proc. SPIE 7842, Laser-Induced Damage in Optical Materials: 2010, 78420C (29 November 2010); https://doi.org/10.1117/12.867216

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available