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6 December 2010 Exposure of high-reflecting fluoride coatings under high fluence conditions at 193nm
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Abstract
The paper presents results of investigations in evaporated LaF3-MgF2 and LaF3-AlF3 classical high-reflecting multilayers deposited on super-polished CaF2 substrates. In addition to typical spectroscopic inspections up to the band edge of fluoride substances in the VUV spectral range, the work is dedicated to the determination of laser-induced damage threshold at moderate pulse numbers for the wavelength 193 nm. Further on, dose dependent irradiation tests are performed well below the fluence level of damage onset indicating changes for the spectral transfer functions. These experimental observations are discussed in order to find a correlation to the characteristic damage behavior of both material combinations. In contrast to the standard evaporation process, partial-reflecting fluoride coatings have been deposited under ion-assisted conditions with fluorine gas. Results of damage tests will show excellent performance to high fluence levels.
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H. Blaschke, W. Riggers, and D. Ristau "Exposure of high-reflecting fluoride coatings under high fluence conditions at 193nm", Proc. SPIE 7842, Laser-Induced Damage in Optical Materials: 2010, 78420I (6 December 2010); https://doi.org/10.1117/12.867257
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