Femtosecond laser damage and ablation of dielectrics: determinism, selectivity, and nanometric resolution

N. Sanner; O. Utéza; B. Chimier; A. Brocas; N. Varkentina; M. Sentis; P. Lassonde; F. Légaré; J. C. Kieffer

doi:10.1117/12.866738

29 November 2010 Femtosecond laser damage and ablation of dielectrics: determinism, selectivity, and nanometric resolution

N. Sanner, O. Utéza, B. Chimier, A. Brocas, N. Varkentina, M. Sentis, P. Lassonde, F. Légaré, J. C. Kieffer

Author Affiliations +

Proceedings Volume 7842, Laser-Induced Damage in Optical Materials: 2010; 78420W (2010) https://doi.org/10.1117/12.866738
Event: Laser Damage Symposium XLII: Annual Symposium on Optical Materials for High Power Lasers, 2010, Boulder, Colorado, United States

Abstract

We present a coupled study of laser-induced damage and ablation of fused silica in the femtosecond regime. Both thresholds are essentially different and investigations under a wide excursion of pulse duration (< 10 fs to 300 fs) and applied fluence (Fth < F < 10 Fth) provide quantitative knowledge on i) the strength of the so-called "deterministic" character of femtosecond laser damaging, linked to ionization mechanisms ; ii) the physical characteristics of surface ablation craters demonstrating that high selectivity and nanometric resolution is achievable.

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N. Sanner, O. Utéza, B. Chimier, A. Brocas, N. Varkentina, M. Sentis, P. Lassonde, F. Légaré, and J. C. Kieffer "Femtosecond laser damage and ablation of dielectrics: determinism, selectivity, and nanometric resolution", Proc. SPIE 7842, Laser-Induced Damage in Optical Materials: 2010, 78420W (29 November 2010); https://doi.org/10.1117/12.866738

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