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2 December 2010 Linear and Non-linear Absorption of TixSi1-xO2-Mixtures
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Abstract
The measurement of absorption in dielectric materials is one of the most important methods for the qualification of the losses of optical components. For this reason, various procedures were developed for the measurement of the absorption losses. One of the most sophisticated and established technique is the laser calorimetric measurement according to ISO11551. The method allows to measure the absolute value of absorption losses. In the presented measurement campaign, two sets of samples are investigated by laser calorimetric measurements. The study displays the results of the linear and non-linear absorption measurements of TixSi1-xO2 -single layers coated by ion beam sputtering. For the determination of the linear absorption behaviour a quasi CW-Laser at the wavelengths 532nm and 1064nm was applied Additionally, the non linear absorption is measured by a Ti:Sapphire CPA-Laser at 790nm.
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M. Jupé, L. Jensen, S. Malobabic, D. Ristau, and K. Starke "Linear and Non-linear Absorption of TixSi1-xO2-Mixtures", Proc. SPIE 7842, Laser-Induced Damage in Optical Materials: 2010, 78421S (2 December 2010); https://doi.org/10.1117/12.867767
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