2 December 2010 Effects of thermal annealing on KDP and DKDP on laser damage resistance at 3ω
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Abstract
Previous work on KDP has shown that thermal annealing could improve laser damage resistance of KDP optics at 3w. However, the improvement varies with the pulse length: whereas a strong improvement was observed at 16ns, no improvement at all was observed for a pulse length of 2.5ns. Whatever the pulse length, though, combinations of laser conditioning and thermal annealing led to better results than laser conditioning alone. The goal of this study is to verify if these results also hold for DKDP. A major difference is that, due to quadratic to monoclinic high temperature transition, the annealing temperature considered for KDP cannot be applied to KDP. This paper reports the temperature range considered for DKDP as well the modifications brought by thermal annealing on laser damage resistance at 12ns and 2.5ns.
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François Guillet, Bertrand Bertussi, Laurent Lamaignère, Cédric Maunier, "Effects of thermal annealing on KDP and DKDP on laser damage resistance at 3ω", Proc. SPIE 7842, Laser-Induced Damage in Optical Materials: 2010, 78421T (2 December 2010); doi: 10.1117/12.868269; https://doi.org/10.1117/12.868269
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