Inhibition of contamination laser induced damage to optical substrates

Bruce H. Weiller; Jesse D. Fowler; Randy M. Villahermosa

doi:10.1117/12.867025

2 December 2010 Inhibition of contamination laser induced damage to optical substrates

Bruce H. Weiller, Jesse D. Fowler, Randy M. Villahermosa

Proceedings Volume 7842, Laser-Induced Damage in Optical Materials: 2010; 784229 (2010) https://doi.org/10.1117/12.867025
Event: Laser Damage Symposium XLII: Annual Symposium on Optical Materials for High Power Lasers, 2010, Boulder, Colorado, United States

Abstract

We have characterized the thresholds for contamination laser induced damage (C-LID) process using toluene as a model contaminant by varying oxygen and toluene concentrations. In the presence of 300 ppm toluene and nitrogen, the damage threshold is (7.8 ± 1.9) × 10³ laser pulses, in synthetic air the damage threshold is (18.0 ± 2.1) × 10³ laser pulses. We have found several high vapor pressure molecules that effectively inhibit the (C-LID) process and greatly extend the lifetime of fused silica optics under high power laser irradiation. With the addition of ~4000 ppm of water, methanol or ethanol, the lifetime exceeds 1 × 10⁶ laser pulses with no damage observed. Possible mechanisms are discussed.

Citation Download Citation

Bruce H. Weiller, Jesse D. Fowler, and Randy M. Villahermosa "Inhibition of contamination laser induced damage to optical substrates", Proc. SPIE 7842, Laser-Induced Damage in Optical Materials: 2010, 784229 (2 December 2010); https://doi.org/10.1117/12.867025

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