2 December 2010 Inhibition of contamination laser induced damage to optical substrates
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Abstract
We have characterized the thresholds for contamination laser induced damage (C-LID) process using toluene as a model contaminant by varying oxygen and toluene concentrations. In the presence of 300 ppm toluene and nitrogen, the damage threshold is (7.8 ± 1.9) × 103 laser pulses, in synthetic air the damage threshold is (18.0 ± 2.1) × 103 laser pulses. We have found several high vapor pressure molecules that effectively inhibit the (C-LID) process and greatly extend the lifetime of fused silica optics under high power laser irradiation. With the addition of ~4000 ppm of water, methanol or ethanol, the lifetime exceeds 1 × 106 laser pulses with no damage observed. Possible mechanisms are discussed.
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Bruce H. Weiller, Bruce H. Weiller, Jesse D. Fowler, Jesse D. Fowler, Randy M. Villahermosa, Randy M. Villahermosa, } "Inhibition of contamination laser induced damage to optical substrates", Proc. SPIE 7842, Laser-Induced Damage in Optical Materials: 2010, 784229 (2 December 2010); doi: 10.1117/12.867025; https://doi.org/10.1117/12.867025
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