Characteristics of subwavelength photolithography based on surface plasmon polaritons

Weihao Ge; Yinfei Xue; Chinhua Wang; Bing Cao

doi:10.1117/12.870345

17 November 2010 Characteristics of subwavelength photolithography based on surface plasmon polaritons

Weihao Ge, Yinfei Xue, Chinhua Wang, Bing Cao

Proceedings Volume 7848, Holography, Diffractive Optics, and Applications IV; 78482O (2010) https://doi.org/10.1117/12.870345
Event: Photonics Asia 2010, 2010, Beijing, China

Abstract

In this work, the characteristics of the subwavelength patterning through periodic metal gratings are discussed. By incorporating different structures of metal gratings, the quality improvements in subwavelength pattern generation are observed in terms of pattern resolution, uniformity and visibility. By using Ag and Al metals, a deep subwavelength (~λ/12 and ~λ/9) pattern with sufficient visibility, and high uniformity can be achieved. The physical mechanism of the quality improvements based on surface-plasmon polaritons (SPPs) theory is discussed. Finite-difference time-domain analysis method is used in the simulation.

Citation Download Citation

Weihao Ge, Yinfei Xue, Chinhua Wang, and Bing Cao "Characteristics of subwavelength photolithography based on surface plasmon polaritons", Proc. SPIE 7848, Holography, Diffractive Optics, and Applications IV, 78482O (17 November 2010); https://doi.org/10.1117/12.870345

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