Design of the structure parameters of photo-resist grating

Xinrong Chen; Chaoming Li; Jianhong Wu; Zhuyuan Hu

doi:10.1117/12.869920

9 November 2010 Design of the structure parameters of photo-resist grating

Xinrong Chen, Chaoming Li, Jianhong Wu, Zhuyuan Hu

Proceedings Volume 7849, Optical Design and Testing IV; 78491Y (2010) https://doi.org/10.1117/12.869920
Event: Photonics Asia 2010, 2010, Beijing, China

Abstract

The pulse compressed grating (i.e. PCG) is the key optical element in high power laser system. In order to obtain the PCG with high diffraction efficiency, it is necessary to design the required structure parameters of the photo-resist grating which is used as the mask of fabricating the PCG in process of etching. The rigorous couple wave theory is adopted to study and search for the suitable structure parameters of the PCG with the 1740lp/mm space frequency and particular basement of dielectric stack films which could produce more than 97% diffraction efficiency. Then the required structure parameters of the mask which is corresponding to those suitable structure parameters of the PCG are determined under some etching technological conditions. In studying the relationship between the diffraction efficiency of the mask and its structure parameters, we found that we could estimate the structure parameters of the mask by its -1st order diffraction efficiency. Then a simple and practical method which can estimate the structure parameters of the photo-resist grating according to its diffraction efficiency is proposed. The measuring setup based on this method is built and the veracity of this method is verified by experiment. The experiment result is present in the paper.

Citation Download Citation

Xinrong Chen, Chaoming Li, Jianhong Wu, and Zhuyuan Hu "Design of the structure parameters of photo-resist grating", Proc. SPIE 7849, Optical Design and Testing IV, 78491Y (9 November 2010); https://doi.org/10.1117/12.869920

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