22 February 2011 Sub-100nm material processing with sub-15 femtosecond picojoule near infrared laser pulses
Author Affiliations +
Abstract
Ultrabroad band 12 femtosecond near infrared laser pulses at transient TW/cm2 intensities and low picojoule pulse energies (mean powers < 20 mW at 85 MHz repetition rate) have been used to perform material nanoprocessing based on multiphoton ionization and plasma formation. Cut sizes of sub-wavelength, sub-100 nm which is far beyond the Abbe diffraction limit have been realized without any collateral damage effect in silicon wafers, photoresists, glass, polymers, metals, and biological targets. Multiphoton sub-15fs microscopes may become novel non-invasive 3D tools for highly precise nanoprocessing of inorganic and organic targets as well as two-photon 3D imaging.
© (2011) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Karsten König, Aisada Uchugonova, Martin Straub, Huijing Zhang, Maziar Afshar, Dara Feili, Helmut Seidel, "Sub-100nm material processing with sub-15 femtosecond picojoule near infrared laser pulses", Proc. SPIE 7903, Multiphoton Microscopy in the Biomedical Sciences XI, 79031M (22 February 2011); doi: 10.1117/12.875004; https://doi.org/10.1117/12.875004
PROCEEDINGS
6 PAGES


SHARE
Back to Top