22 February 2011 Sub-100nm material processing with sub-15 femtosecond picojoule near infrared laser pulses
Author Affiliations +
Ultrabroad band 12 femtosecond near infrared laser pulses at transient TW/cm2 intensities and low picojoule pulse energies (mean powers < 20 mW at 85 MHz repetition rate) have been used to perform material nanoprocessing based on multiphoton ionization and plasma formation. Cut sizes of sub-wavelength, sub-100 nm which is far beyond the Abbe diffraction limit have been realized without any collateral damage effect in silicon wafers, photoresists, glass, polymers, metals, and biological targets. Multiphoton sub-15fs microscopes may become novel non-invasive 3D tools for highly precise nanoprocessing of inorganic and organic targets as well as two-photon 3D imaging.
© (2011) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Karsten König, Karsten König, Aisada Uchugonova, Aisada Uchugonova, Martin Straub, Martin Straub, Huijing Zhang, Huijing Zhang, Maziar Afshar, Maziar Afshar, Dara Feili, Dara Feili, Helmut Seidel, Helmut Seidel, } "Sub-100nm material processing with sub-15 femtosecond picojoule near infrared laser pulses", Proc. SPIE 7903, Multiphoton Microscopy in the Biomedical Sciences XI, 79031M (22 February 2011); doi: 10.1117/12.875004; https://doi.org/10.1117/12.875004

Back to Top