22 February 2011 Sub-100nm material processing with sub-15 femtosecond picojoule near infrared laser pulses
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Abstract
Ultrabroad band 12 femtosecond near infrared laser pulses at transient TW/cm2 intensities and low picojoule pulse energies (mean powers < 20 mW at 85 MHz repetition rate) have been used to perform material nanoprocessing based on multiphoton ionization and plasma formation. Cut sizes of sub-wavelength, sub-100 nm which is far beyond the Abbe diffraction limit have been realized without any collateral damage effect in silicon wafers, photoresists, glass, polymers, metals, and biological targets. Multiphoton sub-15fs microscopes may become novel non-invasive 3D tools for highly precise nanoprocessing of inorganic and organic targets as well as two-photon 3D imaging.
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Karsten König, Karsten König, Aisada Uchugonova, Aisada Uchugonova, Martin Straub, Martin Straub, Huijing Zhang, Huijing Zhang, Maziar Afshar, Maziar Afshar, Dara Feili, Dara Feili, Helmut Seidel, Helmut Seidel, } "Sub-100nm material processing with sub-15 femtosecond picojoule near infrared laser pulses", Proc. SPIE 7903, Multiphoton Microscopy in the Biomedical Sciences XI, 79031M (22 February 2011); doi: 10.1117/12.875004; https://doi.org/10.1117/12.875004
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