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21 February 2011 Absorption of femtosecond laser pulse in fused silica: experiments and modelling
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We present experimental and theoretical investigations of interaction of a femtosecond laser (450 fs pulse at 1025nm) with dielectric materials (fused silica) for the single-shot laser regime. The aim is to analyze and understand the complex physical mechanisms of laser energy absorption yielding to damage and /or ablation. We outline the distinction between the ablation and the damage thresholds for dielectric materials. The evolution of the reflection, transmission and absorption signals is studied as a function of fluence. The experimental curves are accompanied by a modelling, which takes into account the photoionization and avalanche ionization depicting absorption of the laser energy by the material. The incident pulse propagation into the material, the temporal evolution of the electron density, reflection and transmission illustrate the beginning and the duration of the laser pulse absorption. The magnitude of the absorption process is energy density sensitive and, with the increase of the deposited fluence, the onset of absorption is moved temporally to the beginning of the pulse. We show the influence of the effective electron collision frequency on the calculated values of reflection, transmission and absorption. The results are particularly relevant to high micromachining industrial processes.
© (2011) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
N. Varkentina, O. Uteza, N. Sanner, B. Chimier, M. Sentis, and T. Itina "Absorption of femtosecond laser pulse in fused silica: experiments and modelling", Proc. SPIE 7920, Laser Applications in Microelectronic and Optoelectronic Manufacturing (LAMOM) XVI, 792003 (21 February 2011);

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