Multiphoton lithography and ITO structuring by high repetition-rate sub-15 femtosecond laser pulses

Maziar Afshar; Somaie Saremi; Henning Völlm; Dara Feili; Helmut Seidel; Martin Straub; H. Zhang; Karsten König

doi:10.1117/12.875897

25 February 2011 Multiphoton lithography and ITO structuring by high repetition-rate sub-15 femtosecond laser pulses

Maziar Afshar, Somaie Saremi, Henning Völlm, Dara Feili, Helmut Seidel, Martin Straub, H. Zhang, Karsten König

Proceedings Volume 7920, Laser Applications in Microelectronic and Optoelectronic Manufacturing (LAMOM) XVI; 792015 (2011) https://doi.org/10.1117/12.875897
Event: SPIE LASE, 2011, San Francisco, California, United States

Abstract

We report on experiments using a near-infrared Ti:Sapphire laser system based on a 85 MHz, sub-15 fs resonator. In the negative photoresist SU-8 multiphoton polymerization of 3D structures resulted in a minimum line width of approximately 80 nm at aspect ratios in excess of 50:1. The second part of our contribution deals with sub-wavelength nanostructuring and laser-annealing of thin indium-tin-oxide (ITO) films. The ablation experiments allowed for the generation of cuts of sub-100 nm width in periodic and single cut arrangements. Annealing resulted in a different phase of ITO which is more resistive against etching in HCl at room temperature. The dependence of cuts on scan parameters that affect the ITO film properties was investigated.

Citation Download Citation

Maziar Afshar, Somaie Saremi, Henning Völlm, Dara Feili, Helmut Seidel, Martin Straub, H. Zhang, and Karsten König "Multiphoton lithography and ITO structuring by high repetition-rate sub-15 femtosecond laser pulses", Proc. SPIE 7920, Laser Applications in Microelectronic and Optoelectronic Manufacturing (LAMOM) XVI, 792015 (25 February 2011); https://doi.org/10.1117/12.875897

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