8 February 2011 Selective inhibition of polymerization enables sub-diffraction optical lithography
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Proceedings Volume 7927, Advanced Fabrication Technologies for Micro/Nano Optics and Photonics IV; 792709 (2011); doi: 10.1117/12.878961
Event: SPIE MOEMS-MEMS, 2011, San Francisco, California, United States
Abstract
We show that after two-photon excitation of the photo initiator we are able to inhibit the polymerization process with a second beam of different wavelength. For achieving sub-diffraction resolution this is one of the key elements. Remarkably is that these experiments can be performed with a commercially available STED microscope slightly modified for two-photon-excitation (TPE). First experiments featuring an enhanced resolution will be presented.
© (2011) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Benjamin Harke, Paolo Bianchini, Fraz Anjum, Fernando Brandi, Alberto Diaspro, "Selective inhibition of polymerization enables sub-diffraction optical lithography", Proc. SPIE 7927, Advanced Fabrication Technologies for Micro/Nano Optics and Photonics IV, 792709 (8 February 2011); doi: 10.1117/12.878961; https://doi.org/10.1117/12.878961
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KEYWORDS
Microscopes

Polymerization

Stimulated emission depletion microscopy

Scanning electron microscopy

Diffraction

Lithography

Image processing

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