23 February 2011 Structural and optical properties of different dielectric thin films for planar waveguiding applications
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Proceedings Volume 7934, Optical Components and Materials VIII; 79341N (2011) https://doi.org/10.1117/12.883224
Event: SPIE OPTO, 2011, San Francisco, California, United States
Thin films of two different dielectric materials (Yttrium Oxide and Tantalum Pentoxide) were deposited by reactive sputtering and reactive evaporation to determine their suitability as a host for a rare earth doped planar waveguide upconversion laser. The optical properties, structure and crystalline phase of the films were found to be dependent on the deposition method and process parameters. X-ray diffraction (XRD) analysis on several of the 'as-deposited' thin films revealed that the films vary from amorphous to highly crystalline depending on material and process parameters. SEM imaging of the Yttrium Oxide layers revealed a regular column structure confirming their crystalline nature and SEM imaging of the Tantalum Pentoxide layers revealed a smooth amorphous layer confirming their XRD diffractrograms. The dielectric thin film layers which allowed guiding in both the visible and infra-red regions of the spectrum had a more amorphous structure.
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S. J. Pearce, S. J. Pearce, M. D. B. Charlton, M. D. B. Charlton, G. J. Parker, G. J. Parker, J. S. Wilkinson, J. S. Wilkinson, } "Structural and optical properties of different dielectric thin films for planar waveguiding applications", Proc. SPIE 7934, Optical Components and Materials VIII, 79341N (23 February 2011); doi: 10.1117/12.883224; https://doi.org/10.1117/12.883224

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