Fabrication of ZnO channel waveguides for nonlinear optical applications

Edgar Yoshio Morales Teraoka; Tomohiro Kita; Atsushi Tsukazaki; Masashi Kawasaki; Hirohito Yamada

doi:10.1117/12.874439

23 March 2011 Fabrication of ZnO channel waveguides for nonlinear optical applications

Edgar Yoshio Morales Teraoka, Tomohiro Kita, Atsushi Tsukazaki, Masashi Kawasaki, Hirohito Yamada

Proceedings Volume 7940, Oxide-based Materials and Devices II; 79401F (2011) https://doi.org/10.1117/12.874439
Event: SPIE OPTO, 2011, San Francisco, California, United States

Abstract

We present a fabrication procedure for ZnO channel waveguides intended for nonlinear optical applications. Ar ion milling was used to etch the single crystal thin film samples, and the effects of bias power, chamber pressure and Ar flow rate were investigated, finding optimal parameters for waveguide fabrication. The effect of sidewall roughness was estimated by comparing the results of cut-back measurements and an analytical model. We show an easy and effective method for the fabrication of ZnO channel waveguides.

Citation Download Citation

Edgar Yoshio Morales Teraoka, Tomohiro Kita, Atsushi Tsukazaki, Masashi Kawasaki, and Hirohito Yamada "Fabrication of ZnO channel waveguides for nonlinear optical applications", Proc. SPIE 7940, Oxide-based Materials and Devices II, 79401F (23 March 2011); https://doi.org/10.1117/12.874439

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