17 January 2011 Light confinement and propagation characteristics in plasmonic gap waveguides on silicon
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Proceedings Volume 7943, Silicon Photonics VI; 79430R (2011) https://doi.org/10.1117/12.875181
Event: SPIE OPTO, 2011, San Francisco, California, United States
Abstract
Plasmonic waveguiding structures have the ability to confine and propagate light over short distances, typically less than a hundred micrometers. This short propagation length is the price that is paid for confining light to dimensions on the order of a hundred of nanometers. With these scales in mind, several plasmonic devices can be proposed (e.g. wavelength multiplexors) and some of them have been already demonstrated such as Y junctions and directional couplers. Although the dimensions involved in such structures are below the diffraction limit, large-scale optical characterization techniques, such as transmitted power, are still employed. In this contribution, we present a characterization technique for the study of the guided modes in plasmonic gap waveguiding structures that resolves subwavelength-scale features, as it is based on atomic force microscope and on near field scattering optical microscope in guided detection.
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Rafael Salas-Montiel, Rafael Salas-Montiel, Sylvain Blaize, Sylvain Blaize, Aurélien Bruyant, Aurélien Bruyant, Aniello Apuzzo, Aniello Apuzzo, Gilles Lérondel, Gilles Lérondel, Cécile Delacour, Cécile Delacour, Philippe Grosse, Philippe Grosse, Jean-Marc Fédéli, Jean-Marc Fédéli, Alexei Tchelnokov, Alexei Tchelnokov, } "Light confinement and propagation characteristics in plasmonic gap waveguides on silicon", Proc. SPIE 7943, Silicon Photonics VI, 79430R (17 January 2011); doi: 10.1117/12.875181; https://doi.org/10.1117/12.875181
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