24 January 2011 Patterns with PS-b-PMMA block copolymer on various substrates and their applications
Author Affiliations +
Abstract
High density arrays of nanostructures over large area can be formed by self-assembly of block copolymers on a variety of substrates such as silica deposited silicon wafer, glass, GaN, PET etc. This block copolymer thin film, such that the domains are oriented perpendicularly to the substrate, is particularly useful for the formation of templates for patterns. The degradation and elimination of the minor component transforms the material into an array of nanopores to form some patterned template that offer potential benefits in a number of applications. The morphology of the polymer surface is strongly dependent on the thickness of the polymer layer. Moreover it is necessary to control the size and shape in order to get the desired properties. Spin coating fallowed by baking the polymer solution onto the substrate self assembles the components of the polymer. PS and PMMA have significantly different photodegradation properties. Exposure to ultraviolet radiation degrades the PMMA (polymethyl methacrylate) chain that can be removed by rinsing in acetic acid giving patterned holes. Sonicating the samples in different solutions in different steps gives fingerprint pattern or sometimes patterns with PS cylindrical domains with large interstitial spaces. Moreover the interstitial space depends on the composition of the polymer solution. All these controlled patterns made on GaN, Glass can be applied to make photonic crystal
© (2011) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Md. Mahbub Alam, Yu-Rim Lee, Woo-Gwang Jung, "Patterns with PS-b-PMMA block copolymer on various substrates and their applications", Proc. SPIE 7945, Quantum Sensing and Nanophotonic Devices VIII, 794524 (24 January 2011); doi: 10.1117/12.873512; https://doi.org/10.1117/12.873512
PROCEEDINGS
6 PAGES


SHARE
Back to Top