Translator Disclaimer
Paper
1 March 2011 On-chip nanostructures for polarization imaging and multispectral sensing using dedicated layers of modified CMOS processes
Author Affiliations +
Abstract
Sub-wavelength gratings and hole arrays in metal films are applicable for polarization and spectral selective sensors, respectively. We demonstrate the fabrication of wire grid polarizers using standard complementary metal-oxide semiconductor (CMOS) processes. Extraordinary optical transmission of hole arrays was achieved by using the dedicated layer of a modified CMOS process. The structures were simulated using the finite-difference time-domain (FDTD) method and fabricated using the work flow of integrated circuits. A high-speed polarization image sensor with a pixel size of 6 μm was designed and demonstrated, and multispectral sensing was implemented using nanostructures with different spectral filter performances on a single chip.
© (2011) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Stephan Junger, Wladimir Tschekalinskij, Nanko Verwaal, and Norbert Weber "On-chip nanostructures for polarization imaging and multispectral sensing using dedicated layers of modified CMOS processes", Proc. SPIE 7946, Photonic and Phononic Properties of Engineered Nanostructures, 79461D (1 March 2011); https://doi.org/10.1117/12.874785
PROCEEDINGS
7 PAGES


SHARE
Advertisement
Advertisement
Back to Top