Higher speed VCSELs by photon lifetime reduction

Petter Westbergh; Johan S. Gustavsson; Benjamin Kögel; Åsa Haglund; Anders Larsson; Andrew Joel

doi:10.1117/12.873161

7 February 2011 Higher speed VCSELs by photon lifetime reduction

Petter Westbergh, Johan S. Gustavsson, Benjamin Kögel, Åsa Haglund, Anders Larsson, Andrew Joel

Proceedings Volume 7952, Vertical-Cavity Surface-Emitting Lasers XV; 79520K (2011) https://doi.org/10.1117/12.873161
Event: SPIE OPTO, 2011, San Francisco, California, United States

Abstract

The impedance characteristics and the effects of photon lifetime reduction on the performance of high-speed 850 nm VCSELs are investigated. Through S₁₁ measurements and equivalent circuit modeling we show that the parasitic mesa capacitance can be significantly reduced by using multiple oxide layers. By performing a shallow surface etch (25 - 55 nm) on the fabricated VCSELs, we are able to reduce the photon lifetime by up to 80% and thereby significantly improve both static and dynamic properties of the VCSELs. By optimizing the photon lifetime we are able to enhance the 3dB modulation bandwidth of 7 μm oxide aperture VCSELs from 15 GHz to 23 GHz and finally demonstrate errorfree transmission at up to 40 Gbit/s.

Citation Download Citation

Petter Westbergh, Johan S. Gustavsson, Benjamin Kögel, Åsa Haglund, Anders Larsson, and Andrew Joel "Higher speed VCSELs by photon lifetime reduction", Proc. SPIE 7952, Vertical-Cavity Surface-Emitting Lasers XV, 79520K (7 February 2011); https://doi.org/10.1117/12.873161

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