Nanostructre based antireflection coatings for EO/IR sensor applications

Ashok K. Sood; Roger E. Welser; Adam W. Sood; E. James Egerton; Yash R. Puri; David Poxson; Sammer Chhajed Jaehee Cho; E. Fred Schubert; Dennis L. Polla; Nibir K. Dhar; Raymond S. Balcerak; Martin B. Soprano

doi:10.1117/12.882535

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11 February 2011 Nanostructre based antireflection coatings for EO/IR sensor applications

Ashok K. Sood, Roger E. Welser, Adam W. Sood, E. James Egerton, Yash R. Puri, David Poxson, Sammer Chhajed Jaehee Cho, E. Fred Schubert, Dennis L. Polla, Nibir K. Dhar, Raymond S. Balcerak, Martin B. Soprano

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Proceedings Volume 7954, Light-Emitting Diodes: Materials, Devices, and Applications for Solid State Lighting XV; 79540W (2011) https://doi.org/10.1117/12.882535
Event: SPIE OPTO, 2011, San Francisco, California, United States

Abstract

EO/IR Nanosensors are being developed for a variety of Defense and Commercial Systems Applications. These include UV, Visible, NIR, MWIR and LWIR Nanotechnology based Sensors. The conventional SWIR Sensors use InGaAs based IR Focal Plane Array (FPA) that operate in 1.0-1.8 micron region. Similarly, MWIR Sensors use InSb or HgCdTe based FPA that is sensitive in 3-5 micron region. More recently, there is effort underway to evaluate low cost SiGe visible and near infrared band that covers from 0.4 to 1.6 micron. One of the critical technologies that will enhance the EO/IR sensor performance is the development of high quality nanostructure based antireflection coating. Prof. Fred Schubert and his group have used the TiO₂ and SiO₂ graded-index nanowires / nanorods deposited by obliqueangle deposition, and, for the first time, demonstrated their potential for antireflection coatings by virtually eliminating Fresnel reflection from an AlN-air interface over the UV band. This was achieved by controlling the refractive index of the TiO₂ and SiO₂ nanorod layers, down to a minimum value of n = 1.05, the lowest value so far reported In this paper, we will discuss our modeling approach and experimental results for using oblique angle nanowires growth technique for extending the application for UV, Visible and NIR sensors and their utility for longer wavelength application. The AR coating is designed by using a genetic algorithm and fabricated by using oblique angle deposition. The AR coating is designed for the wavelength range of 400 nm to 2500 nm and 0° to 40° angle of incidence. The measured average optical transmittance of an uncoated glass substrate between 1000 nm and 2000 nm is improved from 92.6% to 99.3% at normal incidence by using a two-layer nanostructured AR coating deposited on both surfaces of the glass substrate.

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Ashok K. Sood, Roger E. Welser, Adam W. Sood, E. James Egerton, Yash R. Puri, David Poxson, Sammer Chhajed Jaehee Cho, E. Fred Schubert, Dennis L. Polla, Nibir K. Dhar, Raymond S. Balcerak, and Martin B. Soprano "Nanostructre based antireflection coatings for EO/IR sensor applications", Proc. SPIE 7954, Light-Emitting Diodes: Materials, Devices, and Applications for Solid State Lighting XV, 79540W (11 February 2011); https://doi.org/10.1117/12.882535

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