EUV actinic mask inspection requires a light source with high brightness, high uptime and a small footprint. Adlyte
Corporation has developed reliable, compact and cost-effective EUV sources for mask metrology and inspection
applications with potential to be extended for scanner high volume manufacturing. The EUV source will generate high
brightness of up to 1 kW/mm2·sr. An industry-proven high power Nd:YAG laser irradiates high-frequency tin droplets
with 1.6 kW of power in short pulses. For extended operational lifetime and with high reliability, the collector
integrates two methods to mitigate ionic and neutral debris, and actively manages the thermal load. Latest operational
data will be presented.
"High-brightness LPP source for actinic mask inspection", Proc. SPIE 7969, Extreme Ultraviolet (EUV) Lithography II, 79690C (29 March 2011); doi: 10.1117/12.879786; https://doi.org/10.1117/12.879786