29 March 2011 High-brightness LPP source for actinic mask inspection
Author Affiliations +
Abstract
EUV actinic mask inspection requires a light source with high brightness, high uptime and a small footprint. Adlyte Corporation has developed reliable, compact and cost-effective EUV sources for mask metrology and inspection applications with potential to be extended for scanner high volume manufacturing. The EUV source will generate high brightness of up to 1 kW/mm2·sr. An industry-proven high power Nd:YAG laser irradiates high-frequency tin droplets with 1.6 kW of power in short pulses. For extended operational lifetime and with high reliability, the collector integrates two methods to mitigate ionic and neutral debris, and actively manages the thermal load. Latest operational data will be presented.
© (2011) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
S. Ellwi, S. Ellwi, F. Abreau, F. Abreau, } "High-brightness LPP source for actinic mask inspection", Proc. SPIE 7969, Extreme Ultraviolet (EUV) Lithography II, 79690C (29 March 2011); doi: 10.1117/12.879786; https://doi.org/10.1117/12.879786
PROCEEDINGS
7 PAGES


SHARE
RELATED CONTENT


Back to Top