Evaluation of EUV mask defect using blank inspection, patterned mask inspection, and wafer inspection

Takashi Kamo; Tsuneo Terasawa; Takeshi Yamane; Hiroyuki Shigemura; Noriaki Takagi; Tsuyoshi Amano; Kazuo Tawarayama; Mari Nozoe; Toshihiko Tanaka; Osamu Suga; Ichiro Mori

doi:10.1117/12.879551

29 March 2011 Evaluation of EUV mask defect using blank inspection, patterned mask inspection, and wafer inspection

Takashi Kamo, Tsuneo Terasawa, Takeshi Yamane, Hiroyuki Shigemura, Noriaki Takagi, Tsuyoshi Amano, Kazuo Tawarayama, Mari Nozoe, Toshihiko Tanaka, Osamu Suga, Ichiro Mori

Author Affiliations +

Proceedings Volume 7969, Extreme Ultraviolet (EUV) Lithography II; 79690J (2011) https://doi.org/10.1117/12.879551
Event: SPIE Advanced Lithography, 2011, San Jose, California, United States

Abstract

The key challenge before EUVL is to make defect-free masks, for which it is important to identify the root cause of defects, and it is also necessary to establish suitable critical mask defect size for the production of ULSI devices. Selete has been developing EUV mask infrastructures such as a full-field actinic blank inspection tool and 199nm wavelength patterned mask inspection tool in order to support blank/mask supplier in reducing blank/mask defects which impact on wafer printing. In this paper, by evaluating the printability of programmed phase defects and absorber defects exposed by full-field scanner EUV1, we demonstrate that defect detection sensitivities of ABI (actinic blank inspection) and PI (patterned mask inspection) are higher than that of WI (wafer inspection) in HP32nm. The evaluations were done by comparing the detection sensitivities of full-field actinic blank inspection tool, 199nm wavelength patterned mask inspection tool, and wafer EB inspection tool. And then, based on the native defect analysis of blank/mask, we ascertained that actinic blank inspection and patterned mask inspection developed at Selete, are effective in detecting killer defects both at the main pattern and at light-shield border area.

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Takashi Kamo, Tsuneo Terasawa, Takeshi Yamane, Hiroyuki Shigemura, Noriaki Takagi, Tsuyoshi Amano, Kazuo Tawarayama, Mari Nozoe, Toshihiko Tanaka, Osamu Suga, and Ichiro Mori "Evaluation of EUV mask defect using blank inspection, patterned mask inspection, and wafer inspection", Proc. SPIE 7969, Extreme Ultraviolet (EUV) Lithography II, 79690J (29 March 2011); https://doi.org/10.1117/12.879551

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