Convergence study for lines, spaces between standard OPC, local, and more holistic OPC

L. Perraud; Y. Trouiller; E. Yesilada; F. Robert; F. Foussadier; V. Farys; C. Gardin

doi:10.1117/12.869830

Translator Disclaimer

8 April 2011 Convergence study for lines, spaces between standard OPC, local, and more holistic OPC

L. Perraud; Y. Trouiller; E. Yesilada; F. Robert; F. Foussadier; V. Farys; C. Gardin

Author Affiliations +

Proceedings Volume 7969, Extreme Ultraviolet (EUV) Lithography II; 79691P (2011) https://doi.org/10.1117/12.869830
Event: SPIE Advanced Lithography, 2011, San Jose, California, United States

Abstract

As the OPC scripts become more and more complex for advanced technology nodes, the number of parameters used to control the convergence increases drastically. This paper does not aim to determine what a "good convergence criteria" is but rather to review the efficiency of the existing OPC solutions in terms of accuracy and parameter dependence, to solve simple design layouts. Three different OPC solutions, including a "standard algorithm", a "local convergence OPC" and a more holistic OPC, are compared on a design containing lines and line-ends. A cost function is used to determine the quality of the convergence for each type of structure. A map of convergence (iteration vs OPC Option) will be deduced for each structure.

Citation Download Citation

L. Perraud, Y. Trouiller, E. Yesilada, F. Robert, F. Foussadier, V. Farys, and C. Gardin "Convergence study for lines, spaces between standard OPC, local, and more holistic OPC", Proc. SPIE 7969, Extreme Ultraviolet (EUV) Lithography II, 79691P (8 April 2011); https://doi.org/10.1117/12.869830

ACCESS THE FULL ARTICLE