Characterization and optimization of tin particle mitigation and EUV conversion efficiency in a laser produced plasma EUV light source

Tatsuya Yanagida; Hitoshi Nagano; Yasunori Wada; Takayuki Yabu; Shinji Nagai; Georg Soumagne; Tsukasa Hori; Kouji Kakizaki; Akira Sumitani; Junichi Fujimoto; Hakaru Mizoguchi; Akira Endo

doi:10.1117/12.879189

8 April 2011 Characterization and optimization of tin particle mitigation and EUV conversion efficiency in a laser produced plasma EUV light source

Tatsuya Yanagida, Hitoshi Nagano, Yasunori Wada, Takayuki Yabu, Shinji Nagai, Georg Soumagne, Tsukasa Hori, Kouji Kakizaki, Akira Sumitani, Junichi Fujimoto, Hakaru Mizoguchi, Akira Endo

Author Affiliations +

Proceedings Volume 7969, Extreme Ultraviolet (EUV) Lithography II; 79692T (2011) https://doi.org/10.1117/12.879189
Event: SPIE Advanced Lithography, 2011, San Jose, California, United States

Abstract

A laser produced plasma (LPP) extreme ultraviolet (EUV) light source of 13.5 nm has been developed for next generation lithography. Sn plasma is an efficient generator of 13.5 nm EUV light. On the other hand, deposition of Sn particles which strongly affects EUV collector mirror lifetime is a critical issue for long-term stable operation of the high-power EUV light source. In this paper we describe about the optimization of tin debris mitigation with a compact EUV generation system. We observe almost all of Sn fragments generated after a pre-pulse irradiation are vaporized by a main CO₂ pulse laser with a droplet of 20 μm in diameter. An EUV conversion efficiency (CE) of 3.4% at a maximum is obtained for the 20 μm droplet. These results indicate the debris mitigation can be achieved without degradation of the high EUV CE.

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Tatsuya Yanagida, Hitoshi Nagano, Yasunori Wada, Takayuki Yabu, Shinji Nagai, Georg Soumagne, Tsukasa Hori, Kouji Kakizaki, Akira Sumitani, Junichi Fujimoto, Hakaru Mizoguchi, and Akira Endo "Characterization and optimization of tin particle mitigation and EUV conversion efficiency in a laser produced plasma EUV light source", Proc. SPIE 7969, Extreme Ultraviolet (EUV) Lithography II, 79692T (8 April 2011); https://doi.org/10.1117/12.879189

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