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8 April 2011 Improvements in the EQ-10 electrodeless Z-pinch EUV source for metrology applications
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Now that EUV lithography systems are beginning to ship into the fabs for next generation chips it is more critical that the EUV infrastructure developments are keeping pace. Energetiq Technology has been shipping the EQ-10 Electrodeless Z-pinch™ light source since 2005. The source is currently being used for metrology, mask inspection, and resist development. These applications require especially stable performance in both power and source size. Over the last 5 years Energetiq has made many source modifications which have included better thermal management as well as high pulse rate operation6. Recently we have further increased the system power handling and electrical pulse reproducibility. The impact of these modifications on source performance will be reported.
© (2011) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Stephen F. Horne, Deborah Gustafson, Matthew J. Partlow, Matthew M. Besen, Donald K. Smith, and Paul A. Blackborow "Improvements in the EQ-10 electrodeless Z-pinch EUV source for metrology applications", Proc. SPIE 7969, Extreme Ultraviolet (EUV) Lithography II, 79692Z (8 April 2011);


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