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2 April 2011 High-density patterned media fabrication using jet and flash imprint lithography
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Abstract
The Jet and Flash Imprint Lithography (J-FIL®) process uses drop dispensing of UV curable resists for high resolution patterning. Several applications, including patterned media, are better, and more economically served by a full substrate patterning process since the alignment requirements are minimal. Patterned media is particularly challenging because of the aggressive feature sizes necessary to achieve storage densities required for manufacturing beyond the current technology of perpendicular recording. In this paper, the key process steps for the application of J-FIL to pattern media fabrication are reviewed with special attention to substrate cleaning, vapor adhesion of the adhesion layer and imprint performance at >300 disk per hour. Also discussed are recent results for imprinting discrete track patterns at half pitches of 24nm and bit patterned media patterns at densities of 1 Tb/in2.
© (2011) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Zhengmao Ye, Rick Ramos, Cynthia Brooks, Logan Simpson, John Fretwell, Scott Carden, Paul Hellebrekers, Dwayne LaBrake, Douglas J. Resnick, and S. V. Sreenivasan "High-density patterned media fabrication using jet and flash imprint lithography", Proc. SPIE 7970, Alternative Lithographic Technologies III, 79700L (2 April 2011); https://doi.org/10.1117/12.879932
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