Development and characterization of carbon nanotube processes for NRAM technology

Gilles Amblard

doi:10.1117/12.879142

4 April 2011 Development and characterization of carbon nanotube processes for NRAM technology

Gilles Amblard

Proceedings Volume 7970, Alternative Lithographic Technologies III; 797017 (2011) https://doi.org/10.1117/12.879142
Event: SPIE Advanced Lithography, 2011, San Jose, California, United States

Abstract

NRAM technology, a non-volatile memory based on the use of carbon nanotubes, overcomes the limitations of other memory technology types (including traditional Flash), for sub-40nm nodes, and is currently developed in manufacturing fabs. The NRAM technology process flow involves the deposition of a film of carbon nanotubes onto silicon wafers at several of the critical layers (using spin coating techniques). In this paper, we present the key steps of the development and characterization of carbon nanotube processes applied to NRAM technology, focusing on specific deposition techniques, thickness control, and defectivity.

Citation Download Citation

Gilles Amblard "Development and characterization of carbon nanotube processes for NRAM technology", Proc. SPIE 7970, Alternative Lithographic Technologies III, 797017 (4 April 2011); https://doi.org/10.1117/12.879142

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available