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4 April 2011 Tunable two-mirror laser interference lithography system for large-area nano-patterning
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A novel laser interference lithography system with enhanced tunablility in pattern periodicity and coverage has been designed and tested for large-area nano-patterning in a wide range of a pattern frequency. The tunable feature has been achieved by using two rotational mirrors on expanded beam paths at specific angles for a designed period. With a 325 nm laser wavelength, uniform resist nano-patterns of 250, 500, and 750 nm have been experimentally demonstrated on a 4-inch silicon substrate. This new interferometer configuration offers a convenient and robust way to prepare large-area nanostructures with superior tunability in pattern periods.
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Weidong Mao, Ishan Wathuthanthri, and Chang-Hwan Choi "Tunable two-mirror laser interference lithography system for large-area nano-patterning", Proc. SPIE 7970, Alternative Lithographic Technologies III, 79701K (4 April 2011);

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