4 April 2011 Solid-immersion Lloyd's mirror as a testbed for plasmon-enhanced high-NA lithography
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Abstract
Evanescent-wave imaging is demonstrated using solid-immersion Lloyd's-mirror interference lithography (SILMIL) at λ = 325 nm to produce 44-nm half-pitch structures (numerical aperture, NA = 1.85). At such an ultra-high NA the image depth is severely compromised due to the evanescent nature of the exposure, and the use of reflections from plasmonic under-layers is discussed as a possible solution. Simulations and modelling show that image depths in excess of 100 nm should be possible with such a system, using silver as the plasmonic material. The concept is scalable to 193 nm illumination using aluminium as the plasmonic reflector, and simulation results are shown for 26-nm half-pitch imaging into a 37-nm thick resist layer using this scheme.
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Prateek Mehrotra, Charles W. Holzwarth, Richard J. Blaikie, "Solid-immersion Lloyd's mirror as a testbed for plasmon-enhanced high-NA lithography", Proc. SPIE 7970, Alternative Lithographic Technologies III, 79701L (4 April 2011); doi: 10.1117/12.879121; https://doi.org/10.1117/12.879121
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