20 April 2011 Study of the three-dimensional shape measurement for mask patterns using Multiple Detector CD-SEM
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Abstract
The Multiple Detector CD-SEM acquires the secondary electron from pattern surface at each detector. The 3D shape and height of mask patterns are generated by adding or subtracting signal profile of each detector. In signal profile of the differential image formed in difference between left and right detector signal, including concavo-convex information of mask patterns. Therefore, the 3D shape of mask patterns can be obtained by integrating differential signal profile. This time, we found that proportional relation between pattern height and shadow length on one side of pattern edge. In this paper, we will report experimental results of pattern height measurement. The accuracy of measurement and side wall angle dependency are studied. The proposal method is applied to OMOG masks.
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Isao Yonekura, Isao Yonekura, Hidemitsu Hakii, Hidemitsu Hakii, Masashi Kawashita, Masashi Kawashita, Yasushi Nishiyama, Yasushi Nishiyama, Keishi Tanaka, Keishi Tanaka, Yasutaka Kikuchi, Yasutaka Kikuchi, Tsutomu Murakawa, Tsutomu Murakawa, Soichi Shida, Soichi Shida, Masayuki Kuribara, Masayuki Kuribara, Toshimichi Iwai, Toshimichi Iwai, Jun Matsumoto, Jun Matsumoto, Takayuki Nakamura, Takayuki Nakamura, } "Study of the three-dimensional shape measurement for mask patterns using Multiple Detector CD-SEM", Proc. SPIE 7971, Metrology, Inspection, and Process Control for Microlithography XXV, 797121 (20 April 2011); doi: 10.1117/12.879400; https://doi.org/10.1117/12.879400
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