In this work, we investigate the Negative Tone Develop (NTD) process from a fundamental
materials/process interaction perspective. Several key differences exist between a negative tone develop
process and a traditional positive tone develop system. For example, the organic solvent dissolves the
unexposed material, while the deprotected resist remains intact. This causes key differences in key
patterning properties, such as pattern collapse, adhesion, remaining resist, and photoresist etch selectivity.
We have carried out fundamental studies to understand these new interactions between developer and
remaining resist with negative tone develop systems. We have characterized the dynamic dissolution
behavior of a model system with a quartz crystal microbalance with both positive and negative tone solvent
developers. We have also compared contrast curves, and a fundamental model of image collapse. In
addition, we present first results on Optical Proximity Correction (OPC) modeling results of current
Negative Tone Develop (NTD) resist/developer systems.