15 April 2011 High volume manufacturing capability of negative tone development process
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Abstract
High volume manufacturing capability of negative tone development (NTD) process were discussed in viewpoint of lithography performance, necessary developing time impacting throughput, pattern defectivity, and CD-uniformity (CDU). Dense C/H pattern lithographic performances of the latest resist materials dedicated NTD process were introduced, and the design strategy of these resists were discussed. Best condition of development time was fixed with the study on development time dependences on CD-uniformity and defectivity. Throughput performance of NTD was discussed with the necessary development time. Pattern defectivity studies and CDU studies were carried out on L/S pattern and C/H pattern.
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Shinji Tarutani, Sou Kamimura, Kana Fujii, Keita Katou, Yuuichirou Enomoto, "High volume manufacturing capability of negative tone development process", Proc. SPIE 7972, Advances in Resist Materials and Processing Technology XXVIII, 79720N (15 April 2011); doi: 10.1117/12.879391; https://doi.org/10.1117/12.879391
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