Bound PAG resists: an EUV and electron beam lithography performance comparison of fluoropolymers

Luisa D. Bozano; Phillip J. Brock; Hoa D. Truong; Martha I. Sanchez; Gregory M. Wallraff; William D. Hinsberg; Robert D. Allen; Masaki Fujiwara; Kazuhiko Maeda

doi:10.1117/12.884519

15 April 2011 Bound PAG resists: an EUV and electron beam lithography performance comparison of fluoropolymers

Luisa D. Bozano, Phillip J. Brock, Hoa D. Truong, Martha I. Sanchez, Gregory M. Wallraff, William D. Hinsberg, Robert D. Allen, Masaki Fujiwara, Kazuhiko Maeda

Author Affiliations +

Proceedings Volume 7972, Advances in Resist Materials and Processing Technology XXVIII; 797218 (2011) https://doi.org/10.1117/12.884519
Event: SPIE Advanced Lithography, 2011, San Jose, California, United States

Abstract

One of the most promising resist design strategies for the development of high resolution materials for EUV lithography is the PAG anion-bound polymer approach. We have published several reports in the past few years on the structure/property relationships of anion bound PAG resist polymers. This paper will focus on relative performance of novel bound PAG polymers in EUV and electron beam lithographies. We will analyze the performance characteristics of a series of well characterized bound PAG resist polymers using several polymerizable PAG monomers. Due to the limited access to EUV exposure tools, we analyzed the initial lithographic performance with electron beam lithography for improved cycles of learning. We have found several examples of poor correlation between EUV and e-beam (EB) lithography results. We will offer rational for the difference in performance, with the goal of improved insight into both EB and EUV resist design.

Citation Download Citation

Luisa D. Bozano, Phillip J. Brock, Hoa D. Truong, Martha I. Sanchez, Gregory M. Wallraff, William D. Hinsberg, Robert D. Allen, Masaki Fujiwara, and Kazuhiko Maeda "Bound PAG resists: an EUV and electron beam lithography performance comparison of fluoropolymers", Proc. SPIE 7972, Advances in Resist Materials and Processing Technology XXVIII, 797218 (15 April 2011); https://doi.org/10.1117/12.884519

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available