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15 April 2011 Hexafluoroalcohol (HFA) containing molecular resist materials for high-resolution lithographic applications
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Molecular glass resists have gained attention for the past decade as a potential platform for high resolution lithography. Several molecular resist materials based on the calix[4]resorcinarene system have been developed. Though this molecular system is very versatile, there are several challenges with the synthesis and processing of these materials. The difficulty to synthesize a monodipserse unit, the poor solubility in casting solvents and incompatibility with conventional developer are some noted challenges. We have addressed these issues by designing a new calix[4]resorcinarene resist material with hexafluro alcohol (HFA) units. The resist platform has been evaluated with e-beam and EUV lithography.
© (2011) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Anuja De Silva, Linda K. Sundberg, Ratnam Sooriyakumaran, Luisa Bozano, Greg Breyta, William D. Hinsberg, and Masaki Fujiwara "Hexafluoroalcohol (HFA) containing molecular resist materials for high-resolution lithographic applications", Proc. SPIE 7972, Advances in Resist Materials and Processing Technology XXVIII, 79721Z (15 April 2011);

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