Synthesis and photo-initiated polymerization of silicon-containing hybrid monomers

Yuan Fang; Yingquan Zou

doi:10.1117/12.879295

15 April 2011 Synthesis and photo-initiated polymerization of silicon-containing hybrid monomers

Yuan Fang, Yingquan Zou

Proceedings Volume 7972, Advances in Resist Materials and Processing Technology XXVIII; 79722B (2011) https://doi.org/10.1117/12.879295
Event: SPIE Advanced Lithography, 2011, San Jose, California, United States

Abstract

A series of silicon-containing hybrid monomers which contained both vinyl ether group and allyl ether group had been synthesized. The monomers' photo-polymerization kinetics was investigated with RTIR. Results showed that the hybrid monomers could photo-polymerize effectively and both free radical and cationic polymerization processes were improved. When PAG201 (a kind of cationic photo-initiator) was introduced into the monomers, the conversion of vinyl ether double bond increased sharply. The final conversion was close to 100%, and at the 6 sec, the polymerization achieved maximum. At the same time, the allyl ether double bond left. When 2-Isopropylthioxanthone (ITX, a kind of free radical photo-initiator) was introduced into hybrid system containing PAG201, the final conversion of allyl ether double bond and polymerization rate (R_p) increased obviously. It was demonstrated that the hybrid silicon-containing monomers polymerized rapidly and completely with both of the free radical and cationic photo-initiators. The property showed that the five monomers can be used in nanoimprint resist system or UV imaging materials.

Citation Download Citation

Yuan Fang and Yingquan Zou "Synthesis and photo-initiated polymerization of silicon-containing hybrid monomers", Proc. SPIE 7972, Advances in Resist Materials and Processing Technology XXVIII, 79722B (15 April 2011); https://doi.org/10.1117/12.879295

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