Resist dispense system for further defect reduction

Yusuke Yamamoto; Kouzo Nishi; Koji Takayanagi; Takahiro Okubo; Toshinobu Furusho; Kosuke Yoshihara; Tsuyoshi Shibata

doi:10.1117/12.879339

15 April 2011 Resist dispense system for further defect reduction

Yusuke Yamamoto, Kouzo Nishi, Koji Takayanagi, Takahiro Okubo, Toshinobu Furusho, Kosuke Yoshihara, Tsuyoshi Shibata

Proceedings Volume 7972, Advances in Resist Materials and Processing Technology XXVIII; 797230 (2011) https://doi.org/10.1117/12.879339
Event: SPIE Advanced Lithography, 2011, San Jose, California, United States

Abstract

As pattern size becomes smaller, requirement for defect reduction is getting higher and higher. It is known that defects occur in various steps of lithography process. In this study, we focus on defects related to the resist dispense system. Of those defects, the most typical is bridge type defect which caused by foreign substances contained in resist film. The source of those is considered to be insoluble substances, such as resist gels, in resist liquid. So far, the conventional countermeasure has been the development of resist line filters (optimization of materials, shrinking of pore size, and so on). But, according to the recent reports and our experimental result, we can say that not only filter type but also filtration condition has certain influence on bridge type defect generation. In this study, we examine the influences of resist dispense system and its parameters on bridge type defect generation. This paper provides some experimental data and introduces our approaches to the optimization of resist dispense system and its effects.

Citation Download Citation

Yusuke Yamamoto, Kouzo Nishi, Koji Takayanagi, Takahiro Okubo, Toshinobu Furusho, Kosuke Yoshihara, and Tsuyoshi Shibata "Resist dispense system for further defect reduction", Proc. SPIE 7972, Advances in Resist Materials and Processing Technology XXVIII, 797230 (15 April 2011); https://doi.org/10.1117/12.879339

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available